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How China’s ‘fancy tool’ cut chip defects by 99% for near-perfect lithography

✍️ Zhang Tong 📅 October 30, 2025 04:10 PM 🕐 Scraped: October 30, 2025

Summary: Cryo-ET process pinpoints source of manufacturing flaws to achieve unprecedented clarity and a pathway to major industry cost cuts.

In a major leap for the global semiconductor industry, a joint Chinese research team has developed a method that can slash defects in lithography – a critical step in chipmaking – by up to 99 per cent.

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📝 Article Information

Author

Zhang Tong

Original Publisher

🌍 South China Morning Post

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Published Date

October 30, 2025 at 04:10 PM

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